Key publications

H.K. Taylor, "Defectivity prediction for droplet-dispensed UV nanoimprint lithography, enabled by fast simulation of resin flow at feature, droplet and template scales," presented at SPIE Advanced Lithography, San Jose, CA, February 2016. presentation .pdf

H.K. Taylor, "Enabling layout and process optimization with fast, full-field simulation of droplet-dispensed UV-NIL," presented at Nanoimprint and Nanoprint Technology, Napa, CA, October 2015. abstract .pdf

H.K. Taylor, N. Dhakal, J. Yang and Z. Di, "A chip-scale imprinter with integrated optical interference for calibrating models of NIL resists and resist-stamp boundary conditions," presented at Nanoimprint and Nanoprint Technology, Barcelona, Spain, October 2013. presentation .pdf

H.K. Taylor, "Simulation of roll-to-roll and roll-to-plate NIL: modeling the effects of process speed, imprinting load, roller elasticity, and pattern design," presented at Nanoimprint and Nanoprint Technology, Napa, CA, October 2012. abstract .pdf

H.K. Taylor and E.J. Wong, "Fast simulation of nanoimprint lithography: modeling capillary pressures during resist deformation," presented at Nanoimprint and Nanoprint Technology, Jeju, Korea, Oct. 2011. abstract .pdf | presentation .pptx

D.S. Boning, A.B. Kahng, H.K. Taylor, and Y.-K. Wu, "Chip-scale simulation of residual layer thickness uniformity in thermal nanoimprint lithography: evaluating stamp cavity-height and 'dummy-fill' selection strategies," presented at Nanoimprint and Nanoprint Technology, Copenhagen, Denmark, Oct. 2010. abstract.pdf

H.K. Taylor, K. Smistrup, and D.S. Boning, "Modeling the enhancement of nanoimprint stamp bending compliance by backside grooves: mitigating the impact of wafer nanotopgraphy on residual layer thickness," presented at Nanoimprint and Nanoprint Technology, Copenhagen, Denmark, Oct. 2010. abstract.pdf

H.K. Taylor, K. Smistrup, and D.S. Boning, "Modeling and simulation of stamp deflections in nanoimprint lithography: exploiting backside grooves to enhance residual layer thickness uniformity," presented at Micro- and Nano-Engineering, Genoa, Italy, Sep. 2010. abstract.pdf | poster.pdf

H.K. Taylor and D.S. Boning, "Towards nanoimprint lithography-aware layout design checking," Proc. SPIE, vol. 7641, 764129, 2010. DOI: 10.1117/12.846499 | presentation.pdf

H.K. Taylor and D.S. Boning, "Fast simulation of pattern dependencies in thermal nanoimprint lithography," presented at Nanoimprint and Nanoprint Technology, San Jose, CA, Nov. 2009. abstract.pdf | presentation.pdf